Methodology for standard cell compliance and detailed placement for triple patterning lithography - researchr publication authors

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Bei Yu, Xiaoqing Xu, Jhih-Rong Gao, David Z. Pan. Methodology for standard cell compliance and detailed placement for triple patterning lithography. In Jörg Henkel, editor, The IEEE/ACM International Conference on Computer-Aided Design, ICCAD'13, San Jose, CA, USA, November 18-21, 2013. pages 349-356, IEEE/ACM, 2013. [doi]

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