Integration of feedback control and run-to-run control for plasma enhanced atomic layer deposition of hafnium oxide thin films

Sungil Yun, Yangyao Ding, Yichi Zhang, Panagiotis D. Christofides. Integration of feedback control and run-to-run control for plasma enhanced atomic layer deposition of hafnium oxide thin films. Computers & Chemical Engineering, 148:107267, 2021. [doi]

Abstract

Abstract is missing.