GeC film with high substitutional carbon concentration formed by ion implantation and solid phase epitaxy for strained Ge n-MOSFETs

Bingxin Zhang, Xia An, Xiangyang Hu, Ming Li, Xing Zhang, Ru Huang. GeC film with high substitutional carbon concentration formed by ion implantation and solid phase epitaxy for strained Ge n-MOSFETs. Science in China Series F: Information Sciences, 61(6), 2018. [doi]

Abstract

Abstract is missing.