Virtual Metrology for Semiconductor Chemical Mechanical Planarization Process Using Wide & Deep Learning

Fuzuo Zhang, Wenlan Jiang, Huan-gang Wang. Virtual Metrology for Semiconductor Chemical Mechanical Planarization Process Using Wide & Deep Learning. In ICCPR '21: 10th International Conference on Computing and Pattern Recognition, Shanghai, China, October 15 - 17, 2021. pages 345-349, ACM, 2021. [doi]

Abstract

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