C. H. Zhang, Sunao Katsuki, H. Horta, H. Imamura, Hidenori Akiyama. High-Power EUV Source for Lithography Using Tin Target. In Industry Applications Society Annual Meeting, IAS 2008, Edmonton, Alberta, Canada, 5-9 Octobert, 2008. pages 1-4, IEEE, 2008. [doi]
@inproceedings{ZhangKHIA08,
title = {High-Power EUV Source for Lithography Using Tin Target},
author = {C. H. Zhang and Sunao Katsuki and H. Horta and H. Imamura and Hidenori Akiyama},
year = {2008},
doi = {10.1109/08IAS.2008.236},
url = {http://dx.doi.org/10.1109/08IAS.2008.236},
researchr = {https://researchr.org/publication/ZhangKHIA08},
cites = {0},
citedby = {0},
pages = {1-4},
booktitle = {Industry Applications Society Annual Meeting, IAS 2008, Edmonton, Alberta, Canada, 5-9 Octobert, 2008},
publisher = {IEEE},
isbn = {978-1-4244-2278-4},
}