An investigation of process dependence of porous IMD TDDB

W. Y. Zhang, M. C. Silvestre, A. Selvam, E. Ramanathan, C. Ordonio, J. Schaller, T. Shen, K. B. Yeap, C. Capasso, P. Justison, J. H. Lee. An investigation of process dependence of porous IMD TDDB. In IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015. pages 1, IEEE, 2015. [doi]

@inproceedings{ZhangSSROSSYCJL15,
  title = {An investigation of process dependence of porous IMD TDDB},
  author = {W. Y. Zhang and M. C. Silvestre and A. Selvam and E. Ramanathan and C. Ordonio and J. Schaller and T. Shen and K. B. Yeap and C. Capasso and P. Justison and J. H. Lee},
  year = {2015},
  doi = {10.1109/IRPS.2015.7112819},
  url = {http://dx.doi.org/10.1109/IRPS.2015.7112819},
  researchr = {https://researchr.org/publication/ZhangSSROSSYCJL15},
  cites = {0},
  citedby = {0},
  pages = {1},
  booktitle = {IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015},
  publisher = {IEEE},
  isbn = {978-1-4673-7362-3},
}