An investigation of process dependence of porous IMD TDDB

W. Y. Zhang, M. C. Silvestre, A. Selvam, E. Ramanathan, C. Ordonio, J. Schaller, T. Shen, K. B. Yeap, C. Capasso, P. Justison, J. H. Lee. An investigation of process dependence of porous IMD TDDB. In IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015. pages 1, IEEE, 2015. [doi]

Abstract

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