W. Y. Zhang, M. C. Silvestre, A. Selvam, E. Ramanathan, C. Ordonio, J. Schaller, T. Shen, K. B. Yeap, C. Capasso, P. Justison, J. H. Lee. An investigation of process dependence of porous IMD TDDB. In IEEE International Reliability Physics Symposium, IRPS 2015, Monterey, CA, USA, April 19-23, 2015. pages 1, IEEE, 2015. [doi]
Abstract is missing.