300-V class power n-channel LDMOS transistor implemented in 0.18-μm silicon-on-insulator (SOI) technology

Shuai Zhang, Hsiao-Chin Tuan, Xiaojing Wu, Lei Shi, Jian Wu. 300-V class power n-channel LDMOS transistor implemented in 0.18-μm silicon-on-insulator (SOI) technology. Microelectronics Reliability, 61:125-128, 2016. [doi]

@article{ZhangTWSW16,
  title = {300-V class power n-channel LDMOS transistor implemented in 0.18-μm silicon-on-insulator (SOI) technology},
  author = {Shuai Zhang and Hsiao-Chin Tuan and Xiaojing Wu and Lei Shi and Jian Wu},
  year = {2016},
  doi = {10.1016/j.microrel.2015.11.004},
  url = {http://dx.doi.org/10.1016/j.microrel.2015.11.004},
  researchr = {https://researchr.org/publication/ZhangTWSW16},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {61},
  pages = {125-128},
}