Xiayun Zhao, David W. Rosen. Process modeling and advanced control methods for Exposure Controlled Projection Lithography. In American Control Conference, ACC 2015, Chicago, IL, USA, July 1-3, 2015. pages 3643-3648, IEEE, 2015. [doi]
@inproceedings{ZhaoR15-2,
title = {Process modeling and advanced control methods for Exposure Controlled Projection Lithography},
author = {Xiayun Zhao and David W. Rosen},
year = {2015},
doi = {10.1109/ACC.2015.7171896},
url = {http://dx.doi.org/10.1109/ACC.2015.7171896},
researchr = {https://researchr.org/publication/ZhaoR15-2},
cites = {0},
citedby = {0},
pages = {3643-3648},
booktitle = {American Control Conference, ACC 2015, Chicago, IL, USA, July 1-3, 2015},
publisher = {IEEE},
isbn = {978-1-4799-8684-2},
}