Ge CMOS technology with advanced interface and junction engineering

Yi Zhao, Zejie Zheng, Junkang Li, Dong Ni, Rui Zhang. Ge CMOS technology with advanced interface and junction engineering. In 2018 International Conference on IC Design & Technology, ICICDT 2018, Otranto, Italy, June 4-6, 2018. pages 153-156, IEEE, 2018. [doi]

Abstract

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