Two-step gate-recess process combining selective wet-etching and digital wet-etching for InAlAs/InGaAs InP-based HEMTs - researchr publication authors

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Ying-hui Zhong, Shu-xiang Sun, Wen-bin Wong, Hai-li Wang, Xiao-ming Liu, Zhi-yong Duan, Peng Ding, Zhi Jin. Two-step gate-recess process combining selective wet-etching and digital wet-etching for InAlAs/InGaAs InP-based HEMTs. Journal of Zhejiang University - Science C, 18(8):1180-1185, 2017. [doi]

This author has not been identified. Look up 'Ying-hui Zhong' in GoogleThis author has not been identified. Look up 'Shu-xiang Sun' in GoogleThis author has not been identified. Look up 'Wen-bin Wong' in GoogleThis author has not been identified. Look up 'Hai-li Wang' in GoogleThis author has not been identified. Look up 'Xiao-ming Liu' in GoogleThis author has not been identified. Look up 'Zhi-yong Duan' in GoogleThis author has not been identified. Look up 'Peng Ding' in GoogleThis author has not been identified. Look up 'Zhi Jin' in Google

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