Two-step gate-recess process combining selective wet-etching and digital wet-etching for InAlAs/InGaAs InP-based HEMTs

Ying-hui Zhong, Shu-xiang Sun, Wen-bin Wong, Hai-li Wang, Xiao-ming Liu, Zhi-yong Duan, Peng Ding, Zhi Jin. Two-step gate-recess process combining selective wet-etching and digital wet-etching for InAlAs/InGaAs InP-based HEMTs. Journal of Zhejiang University - Science C, 18(8):1180-1185, 2017. [doi]

Abstract

Abstract is missing.