Journal: Proceedings of the IEEE

Volume 89, Issue 4

423 -- 425José E. Schutt-Ainé, Sung-Mo Kang. Interconnections-addressing the next challenge of IC technology (part I: integration and packaging trends)
426 -- 443Barry K. Gilbert, Michael J. Degerstrom, Patrick J. Zabinski, Thimothy M. Schafer, Gregg J. Fokken, Barbara A. Randall, Daniel J. Schwab, Erik S. Daniel, Scott C. Sommerfeldt. Emerging multigigahertz digital and mixed-signal integrated circuits targeted for military applications: dependence on advanced electronic packaging to achieve full performance
444 -- 455Robert C. Frye. Integration and electrical isolation in CMOS mixed-signal wireless chips
456 -- 466Mau-Chung Frank Chang, Vwani P. Roychowdhury, Liyang Zhang, Hyunchol Shin, Yongxi Qian. RF/wireless interconnect for inter- and intra-chip communications
467 -- 489Dennis Sylvester, Kurt Keutzer. Impact of small process geometries on microarchitectures in systems on a chip
490 -- 504Ron Ho, Kenneth Mai, Mark A. Horowitz. The future of wires
505 -- 528Jason Cong. An interconnect-centric design flow for nanometer technologies
529 -- 555Alina Deutsch, Paul W. Coteus, Gerard V. Kopcsay, Howard H. Smith, Christopher W. Surovic, Byron Krauter, Daniel C. Edelstein, Phillip L. Restle. On-chip wiring design challenges for gigahertz operation
556 -- 573Fabrice Caignet, Sonia Delmas-Bendhia, Etienne Sicard. The challenge of signal integrity in deep-submicrometer CMOS technology
574 -- 576Brian Bowers. Volta and the continuous electric current