A highly-efficient row-structure stencil planning approach for e-beam lithography with overlapped characters - researchr publication authors

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Jian Kuang 0001, Evangeline F. Y. Young. A highly-efficient row-structure stencil planning approach for e-beam lithography with overlapped characters. In Cliff C. N. Sze, Azadeh Davoodi, editors, International Symposium on Physical Design, ISPD'14, Petaluma, CA, USA, March 30 - April 02, 2014. pages 109-116, ACM, 2014. [doi]

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