Jian Kuang 0001, Evangeline F. Y. Young. A highly-efficient row-structure stencil planning approach for e-beam lithography with overlapped characters. In Cliff C. N. Sze, Azadeh Davoodi, editors, International Symposium on Physical Design, ISPD'14, Petaluma, CA, USA, March 30 - April 02, 2014. pages 109-116, ACM, 2014. [doi]
@inproceedings{0001Y14,
title = {A highly-efficient row-structure stencil planning approach for e-beam lithography with overlapped characters},
author = {Jian Kuang 0001 and Evangeline F. Y. Young},
year = {2014},
doi = {10.1145/2560519.2560521},
url = {http://doi.acm.org/10.1145/2560519.2560521},
researchr = {https://researchr.org/publication/0001Y14},
cites = {0},
citedby = {0},
pages = {109-116},
booktitle = {International Symposium on Physical Design, ISPD'14, Petaluma, CA, USA, March 30 - April 02, 2014},
editor = {Cliff C. N. Sze and Azadeh Davoodi},
publisher = {ACM},
isbn = {978-1-4503-2592-9},
}