Frequency domain decomposition of layouts for double dipole lithography

Kanak Agarwal. Frequency domain decomposition of layouts for double dipole lithography. In Sachin S. Sapatnekar, editor, Proceedings of the 47th Design Automation Conference, DAC 2010, Anaheim, California, USA, July 13-18, 2010. pages 404-407, ACM, 2010. [doi]

@inproceedings{Agarwal10-1,
  title = {Frequency domain decomposition of layouts for double dipole lithography},
  author = {Kanak Agarwal},
  year = {2010},
  doi = {10.1145/1837274.1837374},
  url = {http://doi.acm.org/10.1145/1837274.1837374},
  tags = {layout},
  researchr = {https://researchr.org/publication/Agarwal10-1},
  cites = {0},
  citedby = {0},
  pages = {404-407},
  booktitle = {Proceedings of the 47th Design Automation Conference, DAC 2010, Anaheim, California, USA, July 13-18, 2010},
  editor = {Sachin S. Sapatnekar},
  publisher = {ACM},
  isbn = {978-1-4503-0002-5},
}