A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model - researchr publication authors

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Ahmed Awad, Atsushi Takahashi 0001, Chikaaki Kodama. A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model. IEICE Transactions, 99-A(12):2363-2374, 2016. [doi]

This author has not been identified. Look up 'Ahmed Awad' in GoogleThis author has not been identified. Look up 'Atsushi Takahashi 0001' in GoogleThis author has not been identified. Look up 'Chikaaki Kodama' in Google

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