Shayak Banerjee, Kanak B. Agarwal, Michael Orshansky. SMATO: Simultaneous mask and target optimization for improving lithographic process window. In 2010 International Conference on Computer-Aided Design (ICCAD 10), November 7-11, 2010, San Jose, CA, USA. pages 100-106, IEEE, 2010. [doi]
Abstract is missing.