A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes. Review of technology for 157-nm lithography. IBM Journal of Research and Development, 45(5):605-614, 2001. [doi]
@article{BatesRBFKLS01,
title = {Review of technology for 157-nm lithography},
author = {A. Keith Bates and Mordechai Rothschild and Theodore M. Bloomstein and Theodore H. Fedynyshyn and Roderick R. Kunz and Vladimir Liberman and Michael Switkes},
year = {2001},
url = {http://www.research.ibm.com/journal/rd/455/bates.html},
tags = {reviewing},
researchr = {https://researchr.org/publication/BatesRBFKLS01},
cites = {0},
citedby = {0},
journal = {IBM Journal of Research and Development},
volume = {45},
number = {5},
pages = {605-614},
}