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    Review of technology for 157-nm lithography

    A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes. Review of technology for 157-nm lithography. IBM Journal of Research and Development, 45(5):605-614, 2001. [doi]

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