Hole-Induced Threshold Voltage Instability Under High Positive and Negative Gate Stress in SiC MOSFETs

Ayan K. Biswas, Daniel J. Lichtenwalner, Jae Hyung Park, Brett Hull, Satyaki Ganguly, Donald A. Gajewski, Elif Balkas. Hole-Induced Threshold Voltage Instability Under High Positive and Negative Gate Stress in SiC MOSFETs. In IEEE International Reliability Physics Symposium, IRPS 2024, Grapevine, TX, USA, April 14-18, 2024. pages 1-5, IEEE, 2024. [doi]

@inproceedings{BiswasLPHGGB24,
  title = {Hole-Induced Threshold Voltage Instability Under High Positive and Negative Gate Stress in SiC MOSFETs},
  author = {Ayan K. Biswas and Daniel J. Lichtenwalner and Jae Hyung Park and Brett Hull and Satyaki Ganguly and Donald A. Gajewski and Elif Balkas},
  year = {2024},
  doi = {10.1109/IRPS48228.2024.10529422},
  url = {https://doi.org/10.1109/IRPS48228.2024.10529422},
  researchr = {https://researchr.org/publication/BiswasLPHGGB24},
  cites = {0},
  citedby = {0},
  pages = {1-5},
  booktitle = {IEEE International Reliability Physics Symposium, IRPS 2024, Grapevine, TX, USA, April 14-18, 2024},
  publisher = {IEEE},
  isbn = {979-8-3503-6976-2},
}