Hole-Induced Threshold Voltage Instability Under High Positive and Negative Gate Stress in SiC MOSFETs

Ayan K. Biswas, Daniel J. Lichtenwalner, Jae Hyung Park, Brett Hull, Satyaki Ganguly, Donald A. Gajewski, Elif Balkas. Hole-Induced Threshold Voltage Instability Under High Positive and Negative Gate Stress in SiC MOSFETs. In IEEE International Reliability Physics Symposium, IRPS 2024, Grapevine, TX, USA, April 14-18, 2024. pages 1-5, IEEE, 2024. [doi]

Abstract

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