X. Blasco, M. Nafría, X. Aymerich, J. Pétry, Wilfried Vandervorst. Breakdown spots of ultra-thin (EOT<1.5nm) HfO::2::/SiO::2:: stacks observed with enhanced - CAFM. Microelectronics Reliability, 45(5-6):811-814, 2005. [doi]
@article{BlascoNAPV05,
title = {Breakdown spots of ultra-thin (EOT<1.5nm) HfO::2::/SiO::2:: stacks observed with enhanced - CAFM},
author = {X. Blasco and M. Nafría and X. Aymerich and J. Pétry and Wilfried Vandervorst},
year = {2005},
doi = {10.1016/j.microrel.2004.11.042},
url = {http://dx.doi.org/10.1016/j.microrel.2004.11.042},
researchr = {https://researchr.org/publication/BlascoNAPV05},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {45},
number = {5-6},
pages = {811-814},
}