Optimization of WSi::2:: by SiH::4:: CVD: impact on oxide quality

D. Brazzelli, G. Ghidini, C. Riva. Optimization of WSi::2:: by SiH::4:: CVD: impact on oxide quality. Microelectronics Reliability, 41(7):1003-1006, 2001. [doi]

Authors

D. Brazzelli

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G. Ghidini

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C. Riva

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