Optimization of WSi::2:: by SiH::4:: CVD: impact on oxide quality

D. Brazzelli, G. Ghidini, C. Riva. Optimization of WSi::2:: by SiH::4:: CVD: impact on oxide quality. Microelectronics Reliability, 41(7):1003-1006, 2001. [doi]

Abstract

Abstract is missing.