Extracting the relative dielectric constant for high-kappa layers from CV measurements - Errors and error propagation

Octavian Buiu, Steve Hall, O. Engstrom, B. Raeissi, M. Lemme, P. K. Hurley, K. Cherkaoui. Extracting the relative dielectric constant for high-kappa layers from CV measurements - Errors and error propagation. Microelectronics Reliability, 47(4-5):678-681, 2007. [doi]

@article{BuiuHERLHC07,
  title = {Extracting the relative dielectric constant for  high-kappa layers  from CV measurements - Errors and error propagation},
  author = {Octavian Buiu and Steve Hall and O. Engstrom and B. Raeissi and M. Lemme and P. K. Hurley and K. Cherkaoui},
  year = {2007},
  doi = {10.1016/j.microrel.2007.01.006},
  url = {http://dx.doi.org/10.1016/j.microrel.2007.01.006},
  researchr = {https://researchr.org/publication/BuiuHERLHC07},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {47},
  number = {4-5},
  pages = {678-681},
}