0.4V Reconfigurable Near-Threshold TCAM in 28nm High-k Metal-Gate CMOS Process - researchr publication authors

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Yun-Sheng Chan, Po-Tsang Huang, Shang-Lin Wu, Sheng-Chi Lung, Wei-Chang Wang, Wei Hwang, Ching-Te Chuang. 0.4V Reconfigurable Near-Threshold TCAM in 28nm High-k Metal-Gate CMOS Process. In 31st IEEE International System-on-Chip Conference, SOCC 2018, Arlington, VA, USA, September 4-7, 2018. pages 272-277, IEEE, 2018. [doi]

This author has not been identified. Look up 'Yun-Sheng Chan' in GoogleThis author has not been identified. Look up 'Po-Tsang Huang' in GoogleThis author has not been identified. Look up 'Shang-Lin Wu' in GoogleThis author has not been identified. Look up 'Sheng-Chi Lung' in GoogleThis author has not been identified. Look up 'Wei-Chang Wang' in GoogleThis author has not been identified. Look up 'Wei Hwang' in GoogleThis author has not been identified. Look up 'Ching-Te Chuang' in Google

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