Yun-Sheng Chan, Po-Tsang Huang, Shang-Lin Wu, Sheng-Chi Lung, Wei-Chang Wang, Wei Hwang, Ching-Te Chuang. 0.4V Reconfigurable Near-Threshold TCAM in 28nm High-k Metal-Gate CMOS Process. In 31st IEEE International System-on-Chip Conference, SOCC 2018, Arlington, VA, USA, September 4-7, 2018. pages 272-277, IEEE, 2018. [doi]
@inproceedings{ChanHWLWHC18,
title = {0.4V Reconfigurable Near-Threshold TCAM in 28nm High-k Metal-Gate CMOS Process},
author = {Yun-Sheng Chan and Po-Tsang Huang and Shang-Lin Wu and Sheng-Chi Lung and Wei-Chang Wang and Wei Hwang and Ching-Te Chuang},
year = {2018},
doi = {10.1109/SOCC.2018.8618562},
url = {https://doi.org/10.1109/SOCC.2018.8618562},
researchr = {https://researchr.org/publication/ChanHWLWHC18},
cites = {0},
citedby = {0},
pages = {272-277},
booktitle = {31st IEEE International System-on-Chip Conference, SOCC 2018, Arlington, VA, USA, September 4-7, 2018},
publisher = {IEEE},
isbn = {978-1-5386-1491-4},
}