DAMO: Deep Agile Mask Optimization for Full-Chip Scale

Guojin Chen, Wanli Chen, Qi Sun, Yuzhe Ma, Haoyu Yang, Bei Yu 0001. DAMO: Deep Agile Mask Optimization for Full-Chip Scale. IEEE Trans. on CAD of Integrated Circuits and Systems, 41(9):3118-3131, 2022. [doi]

Abstract

Abstract is missing.