Y. T. Chiang, Y. K. Fang, Y. J. Huang, T. H. Chou, S. Y. Yeh, C. S. Lin. Effect of the pre-gate oxide cleaning temperature on the reliability of GOI and devices performances in deep submicron CMOS technology. Microelectronics Reliability, 48(11-12):1786-1790, 2008. [doi]
@article{ChiangFHCYL08, title = {Effect of the pre-gate oxide cleaning temperature on the reliability of GOI and devices performances in deep submicron CMOS technology}, author = {Y. T. Chiang and Y. K. Fang and Y. J. Huang and T. H. Chou and S. Y. Yeh and C. S. Lin}, year = {2008}, doi = {10.1016/j.microrel.2008.08.004}, url = {http://dx.doi.org/10.1016/j.microrel.2008.08.004}, tags = {C++, reliability}, researchr = {https://researchr.org/publication/ChiangFHCYL08}, cites = {0}, citedby = {0}, journal = {Microelectronics Reliability}, volume = {48}, number = {11-12}, pages = {1786-1790}, }