An investigation of surface state capture cross-sections for metal-oxide-semiconductor field-effect transistors using HfO::2:: gate dielectrics - researchr publication

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Fu-Chien Chiu, Wen-Chieh Shih, Joseph Ya-min Lee, Huey-Liang Hwang. An investigation of surface state capture cross-sections for metal-oxide-semiconductor field-effect transistors using HfO::2:: gate dielectrics. Microelectronics Reliability, 47(4-5):548-551, 2007. [doi]

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