Jyun-Yan Chuang, Yu-Zheng Lin, Wei-Cheng Chen, Chang-sheng Lin. The construction of coherence microscope for extreme ultraviolet mask defect inspection in synchrotron facility. In IEEE/SICE International Symposium on System Integration, SII 2017, Taipei, Taiwan, December 11-14, 2017. pages 440-443, IEEE, 2017. [doi]
@inproceedings{ChuangLCL17,
title = {The construction of coherence microscope for extreme ultraviolet mask defect inspection in synchrotron facility},
author = {Jyun-Yan Chuang and Yu-Zheng Lin and Wei-Cheng Chen and Chang-sheng Lin},
year = {2017},
doi = {10.1109/SII.2017.8279252},
url = {https://doi.org/10.1109/SII.2017.8279252},
researchr = {https://researchr.org/publication/ChuangLCL17},
cites = {0},
citedby = {0},
pages = {440-443},
booktitle = {IEEE/SICE International Symposium on System Integration, SII 2017, Taipei, Taiwan, December 11-14, 2017},
publisher = {IEEE},
isbn = {978-1-5386-2263-6},
}