The construction of coherence microscope for extreme ultraviolet mask defect inspection in synchrotron facility

Jyun-Yan Chuang, Yu-Zheng Lin, Wei-Cheng Chen, Chang-sheng Lin. The construction of coherence microscope for extreme ultraviolet mask defect inspection in synchrotron facility. In IEEE/SICE International Symposium on System Integration, SII 2017, Taipei, Taiwan, December 11-14, 2017. pages 440-443, IEEE, 2017. [doi]

Abstract

Abstract is missing.