C. K. Chung, Y. L. Chang, T. S. Chen. Influence of substrate bias on the resistivity and TCR of nanostructured Ta-Si-N films. In 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2009, Shenzhen, China, January 5-8, 2009. pages 551-554, IEEE, 2009. [doi]
@inproceedings{ChungCC09-1,
title = {Influence of substrate bias on the resistivity and TCR of nanostructured Ta-Si-N films},
author = {C. K. Chung and Y. L. Chang and T. S. Chen},
year = {2009},
doi = {10.1109/NEMS.2009.5068640},
url = {http://doi.ieeecomputersociety.org/10.1109/NEMS.2009.5068640},
tags = {C++},
researchr = {https://researchr.org/publication/ChungCC09-1},
cites = {0},
citedby = {0},
pages = {551-554},
booktitle = {4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2009, Shenzhen, China, January 5-8, 2009},
publisher = {IEEE},
isbn = {978-1-4244-4629-2},
}