Using advanced simulation to aid microlithography development

Daniel C. Cole, Eytan Barouch, Edward W. Conrad, Michael Yeung. Using advanced simulation to aid microlithography development. Proceedings of the IEEE, 89(8):1194-1215, 2001. [doi]

Authors

Daniel C. Cole

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Eytan Barouch

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Edward W. Conrad

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Michael Yeung

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