Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM

Donna R. Cote, Son Van Nguyen, William J. Cote, Scott L. Pennington, Anthony K. Stamper, Dragan V. Podlesnik. Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM. IBM Journal of Research and Development, 39(4):437-464, 1995.

Abstract

Abstract is missing.