A. Crespo-Yepes, J. Martín-Martínez, R. Rodríguez, M. Nafría, X. Aymerich. Reversible dielectric breakdown in ultrathin Hf based high-k stacks under current-limited stresses. Microelectronics Reliability, 49(9-11):1024-1028, 2009. [doi]
@article{Crespo-YepesMRNA09,
title = {Reversible dielectric breakdown in ultrathin Hf based high-k stacks under current-limited stresses},
author = {A. Crespo-Yepes and J. Martín-Martínez and R. Rodríguez and M. Nafría and X. Aymerich},
year = {2009},
doi = {10.1016/j.microrel.2009.06.029},
url = {http://dx.doi.org/10.1016/j.microrel.2009.06.029},
tags = {rule-based},
researchr = {https://researchr.org/publication/Crespo-YepesMRNA09},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {49},
number = {9-11},
pages = {1024-1028},
}