MILP-Based Optimization of 2-D Block Masks for Timing-Aware Dummy Segment Removal in Self-Aligned Multiple Patterning Layouts - researchr publication

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Peter Debacker, Kwangsoo Han, Andrew B. Kahng, Hyein Lee, Praveen Raghavan, Lutong Wang. MILP-Based Optimization of 2-D Block Masks for Timing-Aware Dummy Segment Removal in Self-Aligned Multiple Patterning Layouts. IEEE Trans. on CAD of Integrated Circuits and Systems, 36(7):1075-1088, 2017. [doi]

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