Xuan Dong, Lihong Zhang. Advanced nanometer technology analog layout retargeting for lithography friendly design. In IEEE International Symposium on Circuits and Systems, ISCAS 2016, Montréal, QC, Canada, May 22-25, 2016. pages 1262-1265, IEEE, 2016. [doi]
@inproceedings{DongZ16-1, title = {Advanced nanometer technology analog layout retargeting for lithography friendly design}, author = {Xuan Dong and Lihong Zhang}, year = {2016}, doi = {10.1109/ISCAS.2016.7527477}, url = {http://dx.doi.org/10.1109/ISCAS.2016.7527477}, researchr = {https://researchr.org/publication/DongZ16-1}, cites = {0}, citedby = {0}, pages = {1262-1265}, booktitle = {IEEE International Symposium on Circuits and Systems, ISCAS 2016, Montréal, QC, Canada, May 22-25, 2016}, publisher = {IEEE}, isbn = {978-1-4799-5341-7}, }