Advanced nanometer technology analog layout retargeting for lithography friendly design

Xuan Dong, Lihong Zhang. Advanced nanometer technology analog layout retargeting for lithography friendly design. In IEEE International Symposium on Circuits and Systems, ISCAS 2016, Montréal, QC, Canada, May 22-25, 2016. pages 1262-1265, IEEE, 2016. [doi]

Abstract

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