Predicting variability in nanoscale lithography processes

Dragoljub Gagi Drmanac, Frank Liu, Li-C. Wang. Predicting variability in nanoscale lithography processes. In Proceedings of the 46th Design Automation Conference, DAC 2009, San Francisco, CA, USA, July 26-31, 2009. pages 545-550, ACM, 2009. [doi]

@inproceedings{DrmanacLW09,
  title = {Predicting variability in nanoscale lithography processes},
  author = {Dragoljub Gagi Drmanac and Frank Liu and Li-C. Wang},
  year = {2009},
  doi = {10.1145/1629911.1630053},
  url = {http://doi.acm.org/10.1145/1629911.1630053},
  tags = {C++},
  researchr = {https://researchr.org/publication/DrmanacLW09},
  cites = {0},
  citedby = {0},
  pages = {545-550},
  booktitle = {Proceedings of the 46th Design Automation Conference, DAC 2009, San Francisco, CA, USA, July 26-31, 2009},
  publisher = {ACM},
  isbn = {978-1-60558-497-3},
}