Andrew J. Fleming, Adrian Wills, Omid T. Ghalehbeygi, Ben Routley, Brett Ninness. A nonlinear programming approach to exposure optimization in scanning laser lithography. In 2016 American Control Conference, ACC 2016, Boston, MA, USA, July 6-8, 2016. pages 5811-5816, IEEE, 2016. [doi]
Abstract is missing.