Regularized level-set-based inverse lithography algorithm for IC mask synthesis

Zhen Geng, Zheng Shi, Xiaolang Yan, Kai-sheng Luo. Regularized level-set-based inverse lithography algorithm for IC mask synthesis. Journal of Zhejiang University - Science C, 14(10):799-807, 2013. [doi]

@article{GengSYL13,
  title = {Regularized level-set-based inverse lithography algorithm for IC mask synthesis},
  author = {Zhen Geng and Zheng Shi and Xiaolang Yan and Kai-sheng Luo},
  year = {2013},
  doi = {10.1631/jzus.C1300050},
  url = {http://dx.doi.org/10.1631/jzus.C1300050},
  researchr = {https://researchr.org/publication/GengSYL13},
  cites = {0},
  citedby = {0},
  journal = {Journal of Zhejiang University - Science C},
  volume = {14},
  number = {10},
  pages = {799-807},
}