A comprehensive modeling framework for gate stack process dependence of DC and AC NBTI in SiON and HKMG p-MOSFETs

N. Goel, K. Joshi, S. Mukhopadhyay, N. Nanaware, S. Mahapatra. A comprehensive modeling framework for gate stack process dependence of DC and AC NBTI in SiON and HKMG p-MOSFETs. Microelectronics Reliability, 54(3):491-519, 2014. [doi]

Abstract

Abstract is missing.