An IEC 61499 based run-to-run controller for chemical mechanical planarization process - researchr publication authors

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Kiah Mok Goh, Benny Tjahjono, Abdul Manaf, Anton J. R. Aendenroomer. An IEC 61499 based run-to-run controller for chemical mechanical planarization process. In Proceedings of 13th IEEE International Conference on Emerging Technologies and Factory Automation, ETFA 2008, September 15-18, 2008, Hamburg, Germany. pages 25-28, IEEE, 2008. [doi]

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