Kiah Mok Goh, Benny Tjahjono, Abdul Manaf, Anton J. R. Aendenroomer. An IEC 61499 based run-to-run controller for chemical mechanical planarization process. In Proceedings of 13th IEEE International Conference on Emerging Technologies and Factory Automation, ETFA 2008, September 15-18, 2008, Hamburg, Germany. pages 25-28, IEEE, 2008. [doi]
@inproceedings{GohTMA08,
title = {An IEC 61499 based run-to-run controller for chemical mechanical planarization process},
author = {Kiah Mok Goh and Benny Tjahjono and Abdul Manaf and Anton J. R. Aendenroomer},
year = {2008},
doi = {10.1109/ETFA.2008.4638364},
url = {http://dx.doi.org/10.1109/ETFA.2008.4638364},
tags = {rule-based},
researchr = {https://researchr.org/publication/GohTMA08},
cites = {0},
citedby = {0},
pages = {25-28},
booktitle = {Proceedings of 13th IEEE International Conference on Emerging Technologies and Factory Automation, ETFA 2008, September 15-18, 2008, Hamburg, Germany},
publisher = {IEEE},
}