Improving dual Vt technology by simultaneous gate sizing and mechanical stress optimization

Junjun Gu, Gang Qu, Lin Yuan, Cheng Zhuo. Improving dual Vt technology by simultaneous gate sizing and mechanical stress optimization. In 2011 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), San Jose, California, USA, November 7-10, 2011. pages 732-735, IEEE, 2011. [doi]

Abstract

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