Roberto Guerrieri, Andrew R. Neureuther. Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography. IEEE Trans. on CAD of Integrated Circuits and Systems, 7(7):755-764, 1988. [doi]
@article{GuerrieriN88,
title = {Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithography},
author = {Roberto Guerrieri and Andrew R. Neureuther},
year = {1988},
doi = {10.1109/43.3946},
url = {http://doi.ieeecomputersociety.org/10.1109/43.3946},
researchr = {https://researchr.org/publication/GuerrieriN88},
cites = {0},
citedby = {0},
journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
volume = {7},
number = {7},
pages = {755-764},
}