Andrew R. Neureuther - researchr alias

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Viewing Publication 1 - 14 from 14

2010

Parameter-specific ring oscillator for process monitoring at the 45 nm nodeLynn T.-N. Wang, Nuo Xu, Seng Oon Toh, Andrew R. Neureuther, Tsu-Jae King Liu, Borivoje Nikolic. cicc 2010: 1-4 [doi]

2008

Crosstalk Noise Variation Assessment and Analysis for the Worst Process CornerJae-Seok Yang, Andrew R. Neureuther. isqed 2008: 352-356 [doi]

2004

A Pattern Matching System for Linking TCAD and EDAFrank Gennari, Andrew R. Neureuther. isqed 2004: 165-170 [doi]

1995

Massively parallel electromagnetic simulation for photolithographic applicationsAlfred Kwok Kit Wong, Roberto Guerrieri, Andrew R. Neureuther. tcad, 14(10):1231-1240, 1995. [doi]

1994

Models and algorithms for three-dimensional topography simulation with SAMPLE-3DEdward W. Scheckler, Andrew R. Neureuther. tcad, 13(2):219-230, 1994. [doi]

Algorithms for simulation of three-dimensional etchingKenny K. H. Toh, Andrew R. Neureuther, Edward W. Scheckler. tcad, 13(5):616-624, 1994. [doi]

1993

An efficient volume-removal algorithm for practical three-dimensional lithography simulation with experimental verificationEdward W. Scheckler, Nelson N. Tam, Anton K. Pfau, Andrew R. Neureuther. tcad, 12(9):1345-1356, 1993. [doi]

1992

A utility-based integrated system for process simulationEdward W. Scheckler, Alexander S. Wong, Robert K. Wang, Goodwin R. Chin, John R. Camagna, Andrew R. Neureuther, Robert W. Dutton. tcad, 11(7):911-920, 1992. [doi]

1991

1988

Simulation of microcrack effects in dissolution of positive resist exposed by X-ray lithographyRoberto Guerrieri, Andrew R. Neureuther. tcad, 7(7):755-764, 1988. [doi]

SIMPL-2: (SIMulated Profiles from the Layout-Version 2)K. Lee, Andrew R. Neureuther. tcad, 7(2):160-167, 1988. [doi]

1966

Interaction of Modulated Electron Beams With Open Periodic StructuresAndrew R. Neureuther. PhD thesis, University of Illinois Urbana-Champaign, USA, 1966. [doi]

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