Optimization of 3D Stacked Nanosheets in 5nm Gate-all-around Transistor Technology

Anil Kumar Gundu, Volkan Kursun. Optimization of 3D Stacked Nanosheets in 5nm Gate-all-around Transistor Technology. In Gang Qu 0001, Jinjun Xiong, Danella Zhao, Venki Muthukumar, Md Farhadur Reza, Ramalingam Sridhar, editors, 34th IEEE International System-on-Chip Conference, SOCC 2021, Las Vegas, NV, USA, September 14-17, 2021. pages 25-28, IEEE, 2021. [doi]

Abstract

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